RadTech UV/EB Technology Conference & Expo 2008
May 4-7, 2008
Lakeside Center at McCormick Place
Chicago, Illinois - United States of America

NEW PRODUCT DEBUT ONE - Free To All Attendees

ESI introduces the "Nitro Mizer" and a new Remote PLC
Rick Sanders, Energy Sciences Inc.

Innovative Products for Energy Curable Inks and Coatings
Patrick Saab, CYTEC

UV Hybrid Offset Inks – GENOMER* 7227
Reto Weder, RAHN USA Inc.

Growing UV"A" Coverage
Bob Bonham, H&S Autoshot, Inc.

UV Cured Flooring with Zero VOC’s
Dan Sweetwood, Allied PhotoChemical

Oligomer Innovations from Bomar Specialties Company
David Zopf, Bomar Specialties Company

Color-on-demand technology use in UV/EB dosimetry and other applications
Alex Mejiritski, Spectra Group Limited, Inc.

New SLM UV-LED based systems from Phoseon Technology
Tom Molamphy, Phoseon Technology

Next Generation UV from Honle
Jim McCusker, Honle UV

New Low Viscosity Allophanate Urethane Acrylates for Metal and Plastic Applications
Michael Dvorchak, Bayer MaterialScience

SmartPak - The Digital Ballast Solution for Lamp Head Control
Ken Sturgess, UV-Technik

Integrating UV Radiometer for High  Irradiance Flash Tubes
Joe May, EIT Instrument Markets

nanoresins - INNOVATION FOR TOP PERFORMANCE
Marco Heuer, nanoresins

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