RadTech UV/EB Technology Conference & Expo 2008
May 4-7, 2008
Lakeside Center at McCormick Place
Chicago, Illinois - United States of America

Application of Waterbased UV-Curable Dispersions for Plastic Coatings
Masahiro Itoh, Eiju Ichinose, Ichiro Muramatsu, Dainippon Ink and Chemicals, Incorporated
Abstract: Stable low-VOC dispersions of conventional UV-oligomers/monomers have been developed by using novel polymer dispersant, and those can be applied to plastic coatings. In this paper some properties of the dispersions and the film performances will be presented.

Non-ionic Photoacid Generators for i-Line: Synthesis, Photochemistry,
and Application to Photocrosslinking System
Masamitsu Shirai, Department of Applied Chemistry, Osaka Prefecture University
Abstract: UV curing systems based on cationic process are significant because the systems have several advantages compared to the radical process. Photoacid generators are essential for the cationic UV curing system. In this study non-ionic photoacid generators (PAGs) that are highly sensitive to i-line (365nm) or g-line (436nm) were designed and synthesized. Furthermore, photochemistry of those PAGs and their application to photocrosslinking systems were studied.

Photo-cured Organic-Inorganic Nano-Hybrid Materials -
Preparation and Optical Properties
Kimihiro Matsukawa, Osaka Municipal Technical Research Institute
Abstract: Organic-inorganic nano-hybrids, which are molecularly interacted with organic and inorganic components, are one of most attractive materials for advanced applications. As an inorganic component, functional silsesquioxane were applied for photo-curing system, such as radical polymerization, cationic polymerization, and thiol-ene reaction. These cured materials were transparent, because of each components were dispersed in nano meter size. They are expected to become useful opto-materials with a tunable refractive index.

Fabrication of the Hybrid PEM Consists of Perfluoro-Sulfonic Acid
and Sulfonated PS-g-FEP using EB-Grafting
Akihiro OSHIMA, Advanced Research Institute for Science and Engineering, WASEDA UNIVERSITY
Abstract: The performance of polymer electrolyte fuel cell (PEFC) is affected by an interfacial property between proton exchange membrane (PEM) and electrodes. Thus, to develop a well-laminated membrane electrode assemblies (MEAs), the hybrid PEM ) consists of perfluoro-sulfonic acid (PFSA) and sulfonated polystyrene-g-tetrafluoroethylene-co-hexafluoropropylene (s-FEP) synthesized by soft electron beam (soft-EB) induced grafting method, was fabricated by mixing s-FEP with sulfonic ionomer whicht is applied to coat the interface of the PEM and electrodes. The obtained hybrid PEM was characterized in terms of water uptake, ion exchange capacity, polarization performance and electrochemical impedance.

Evaluations of Phenyl Acrylic Derivatives as UV-Curable Optical Materials
with High Refractive Index
Yasuyuki Sanai, Functional Materials Laboratory, Toagosei Co., Ltd.
Abstract: Phenyl acrylic derivatives were synthesized, and major properties were compared with corresponding phenoxyethyl acrylic ones. Phenyl acrylic derivatives showed lower viscosity compared to corresponding phenoxyethyl ones, and were expected that they were suitable materials for minute processing such as lens sheets, nanoimprint, and so on. The difference of UV absorption was seen between phenyl esters and phenoxyethyl esters, and it could influence the light-resistance of the cured film as well as photocurability. In this presentation, the optical properties of the cured films and the reactivity ratio with some typical monomers also will be reported to serve as a reference for the design of the formulations using these acrylic derivatives for various applications.

Nonlinear Organic Reaction of Carbamates as Base Amplifiers to Proliferate
aliphatic amines and their application to a novel photoreactive system
Koji Arimitsu, Tokyo University of Science
Abstract: A novel concept of base proliferation for improving the photosensitivity of base-sensitive materials is described by presenting the autocatalytic transformation of carbamates into aliphatic amines. For example, a 9-fluorenylmethyl carbamate, as a base amplifier, was subjected to a base-catalyzed fragmentation reaction to liberate the corresponding amine, which can then act as a catalyst for decomposing parent molecules, leading to autocatalytic decomposition. Consequently, the amine is generated from an equimolar amount of the carbamate using a catalytic amount of the same amine. Furthermore, combining base amplifiers with photoreactive materials relying on base-catalyzed reactions resulted in the marked improvement of photosensitivity characteristics.

Developments of Photosensitive Polyimides and Photosensitive Polybenzoxazoles
Mitsuru Ueda, Tokyo Institute of Technology
Abstract: Photosensitive polyimides (PSPIs) and polybenzoxazoles (PSPBOs) have been attracting great attention as insulating materials or protecting packages in microelectronics industries because they can be directly patterned by action of UV irradiation. The photolithographic method of PIs and PBOs is advantageous due to simplifying process steps as well as their outstanding properties. This article presents developments of PSPIs and PSPBOs devoted by our group. After a brief introduction on PIs and PBOs, a typical patterning process out of photosensitive polymers in respects of both negative- and positive-working are described, followed by introducing details on each resist system involving PSPIs and PSPBOs. Especially, what and how to form the patterns under UV exposure and heat treatment is the core subject of this article with understanding each of their chemistries undertaken in various ways.

Photoreactive Polymer Thin Films for Controlling Nanostructures
Takahiro Seki, Department of Molecular Design and Engineering, Graduate School of Engineering, Nagoya University
Abstract: Liquid crystalline photoreactive (mostly photochromic) polymer thin films are able to align various types of functional materials. In this paper, selected topics that are currently studied in our group will be presented. Topics will involve surface photoalignment of silica with nano-sized channels or dye columns, photoalignment of microphase separated nanostructures of block copolymers, and its extension to inscribe hierarchical structures. These prototype systems are anticipated to give clues to fabricate new photoreacting materials for the future.

The characteristic of the Secondary Thiol Compound and its Application
Katsumi Murofushi, Corporate R&D Center, Showa Denko KK
Abstract:

Photosensitive Optical Waveguide Film for Optical Interconnection
Atsushi Takahashi, Advanced Materials R&D Center Hitachi Chemical Co., Ltd.
Abstract: Next generation high performance electronics requires high-speed, high-density and low power consumption signal transmission. The optical interconnection is one of the best promising solutions and the optical waveguide technology is a key driver. This paper presents photosensitive polymer film materials with optical transparency and thermo-stability. The materials are designed to fabricate high density multimode optical waveguides, which are suitable for optical interconnections, using lamination and exposure/development processes. The authors report design of the materials, process, and properties of optical waveguides, as well as future aspects of applications.

The Characteristics of Direct Current UV Lamps and their Effects on Curable Films
Kiyoko Kawamura, Kazuo Ashikaga, Teruo Orikasa, Chemistry and Process Development,
Fusion UV Systems Japan KK
Abstract: The characteristics of direct current UV lamps and their effects on curable films have been investigated. The diversification of fields using materials displaying functional properties conferred by the microstructure formed through the UV curing reaction has been accompanied by a renewed awareness of UV-emitting light sources, which have previously received little attention. The UV curing process determines the final properties of the UV-curable material, but the source that emits UV light is not merely a light-emitting device. The emission behavior of the light source also has a significant influence on the cross-linked microstructure, playing a crucial role in altering, potentially to a great extent, the final properties displayed by the cured material.

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